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ZnO:Al thin films deposited on transparent TPT substrates by magnetron sputtering were etched in acetic acid solution. The effects of etching solution concentration and etching time on the structure and properties of ZnO:Al films were investigated. The obtained films had a hexagonal structure and a highly preferred orientation with the c-axis perpendicular to the substrate. The ZAO film etched in...
Aluminum doped ZnO thin films (ZnO:Al) deposited on flexible substrates are suitable to be used as transparent conductive oxide (TCO) thin films in solar cells because of the excellent optical and electrical properties. TPT films are a kind of composite materials and are usually used as encapsulation material of solar panels. In this paper, ZnO:Al film was firstly deposited on transparent TPT substrate...
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