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Li 2 B 4 O 7 polycrystalline films on silica glass and Si(111) substrates were prepared by chemical solution decomposition(CSD) method. After spin coating, the wet film was dried at 200 °C, and then annealed at different temperatures to form polycrystalline Li 2 B 4 O 7 film. These annealed films were characterized by using X-ray diffraction (XRD), Fourier...
Zinc oxide (ZnO) films were deposited on silica glass substrates using metal–organic chemical vapor deposition (MOCVD) with diethyl zinc (DEZn) as the Zn precursor and ethanol as the oxygen source. Annealing was performed at 600°C for 1 h in air. The X-ray diffraction (XRD) patterns of the samples show sharp diffraction peaks for ZnO (0002), which indicates that the films are highly c-axis oriented...
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