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Within the physical vapor deposition (PVD) high power pulse magnetron sputtering (HPPMS) or high power impulse magnetron sputtering (HiPIMS) is a frequently studied technology in the last years. HPPMS offers the possibility to produce coatings with lower roughness, denser microstructure and better mechanical properties in comparison to direct current magnetron sputtering (dcMS). However, HPPMS is...
The ion energy is known to have a strong influence on the properties of coatings deposited by physical vapor deposition (PVD). Therefore, the ion energy distribution (IEDF) especially measured at the substrate side is of great interest for understanding the coating growth. In PVD coating processes the ion energy at the substrate can be adjusted by applying a negative voltage (bias) to the substrate...
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