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Nanometer‐thick Al/SiC periodic multilayers, designed for the Extreme Ultra Violet (EUV) range, have been characterized by different techniques dedicated to such thin multilayers (each between 4 and 10 nm thick). In order to decrease the roughness and to improve the optical performances of the stacks, an ultrathin (2 nm) refractory metal layer has also been introduced, thus making Al/W/SiC and Al/Mo/SiC...
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