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ZnO thin films with highly c-axis orientation have been fabricated on p-type Si(111) substrates at 400°C by pulsed laser deposition (PLD) from a metallic Zn target with oxygen pressures between 0.1 and 0.7mbar. Experimental results indicate that the films deposited at 0.3 and 0.5mbar have better crystalline and optical quality and flatter surfaces than the films prepared at other pressures. The full...
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