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Atomic force microscopy (AFM), together with X-ray photoelectron spectroscopy (XPS), has been used to investigate the microstructure of air-cleaved mica surfaces modified by an oxygen RF plasma discharge run under a range of different conditions. The dramatic changes in the topography and the chemical composition in the mica surfaces processed are found to depend strongly on the plasma etching parameters...
Atomic force microscopy (AFM), together with X-ray photoelectron spectroscopy (XPS), has been used to investigate the topography and composition of air-cleaved mica surfaces modified by an argon RF-plasma discharge run at various power levels. At low power, the plasma-treated surfaces of the mica were formed to show more or less uniformly distributed dome-shaped topographical features. The RMS roughness...
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