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The influences of silicon-rich shallow trench isolation (STI) on total ionizing dose (TID) hardening and gate oxide integrity (GOI) in a 130nm partially depleted silicon-on-insulator (SOI) complementary metal-oxide semiconductor (CMOS) technology are investigated. Radiation-induced charges buildup in STI oxide can invert the parasitic sidewall channel of the n-channel transistor, which will increase...
In this work, single transistor latch effects induced by total dose irradiation for 0.13μm partially depleted silicon-on-insulator (PDSOI) n-type metal-oxide-semiconductor field effect transistors (NMOSFETs) were investigated. The front gate transfer characteristics under different bias configurations with forward and reverse gate voltage sweep are characterized to evaluate the latch phenomenon. The...
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