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The availability of high‐quality, large‐scale, and single‐crystal wafer‐scale graphene films is fundamental for key device applications in the field of electronics, optics, and sensors. Synthesis determines the future: unleashing the full potentials of such emerging materials relies heavily upon their tailored synthesis in a scalable fashion, which is by no means an easy task to date. This review...
The nitride films with high indium (In) composition play a crucial role in the fabrication of In‐rich InGaN‐based optoelectronic devices. However, a major limitation is In incorporation requiring a low temperature during growth at the expense of nitride dissociation. Here, to overcome this limitation, a strain‐modulated growth method, namely the graphene (Gr)‐nanorod (NR) enhanced quasi‐van der Waals...
Memristor, processing data storage and logic operation all‐in‐one, is an advanced configuration for next generation computer. In this work, a bismuth doped tin oxide (Bi:SnO2) memristor with ITO/Bi:SnO2/TiN structure has been fabricated. Observing from transmission electron microscope (TEM) for the Bi:SnO2 device, it is found that the bismuth atoms surround the surface of SnO2 crystals to form the...
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