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Transparent conductive NiO thin films with 18at% Cu dopant were fabricated by ion beam assisted deposition (IBAD). Their structural and optoelectronic properties were compared with undoped NiO films and NiO films doped with 12at% Cu, and also compared with NiO:Cu (18at%) films deposited by RF sputtering as reported in our previous work. The results show that the crystallinity of NiO thin films deposited...
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