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We report here for the first time, preparation of the ilmenite titanate MgTiO 3 thin films on Si and SrTi03 substrates by atmospheric pressure metalorganic chemical vapor deposition (APMOCVD) technique. Magnesium acetylacetonate [Mg(acac) 2 ] and titanium isopropoxide [TIP] were used as the Mg and Ti precursors, and O 2 was the oxidizing gas. The deposited films were investigated...
A new technology of KDP crystal growth is proposed for crystals grown at {101} or {011} pyramidal face seed. By the Holden method using temperature reduction, large single crystals were obtained. The grown crystals were optically characterized.
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