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The thermodynamic modeling of the deposition of the condensed phase of a complex composition has been performed in the Si-C-N-O-H system in the broad temperature range of 300–1300 K under total pressure Ptotal0 = 6−7×10−2 Torr and residual air pressure in reactor Pres = 5 × 10−3 Torr using the initial gas mixtures of organosilicon compound, hexamethyldisilazane (HMDS), with nitrogen, oxygen,...
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