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In this work, we have investigated the wet etching of MOCVD grown HfO 2 film using diluted HF. The effect of various implant species on the etch rate was also extensively studied. Etch depth profile for as-deposited film shows that etch rate is higher at the surface and near the interface compared to its bulk. A ~15 A interfacial layer is unable to etch completely. The etch rate for annealed...
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