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High-Al-content AlxGa1−xN films with x varying from 0.33 to 0.79 were grown on GaN templates with the high temperature AlN (HT-AlN) interlayer by metal organic chemical vapor deposition (MOCVD). The best crystalline quality, among these AlxGa1−xN alloys, can be obtained for an AlN mole fraction x = 0.55, where the full-width at half-maximum of the Al0.55Ga0.45N (0002) diffraction peak was measured...
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