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Metal organic chemical vapor deposition (MOCVD) technology is a very efficient way to uniformly grow multi-chip, multilayer and a big area thin film. Kinetic Monte Carlo (KMC) method is one of the important research tools that carry out dynamic simulation of atomic thin films growth. Based on the method of KMC, this paper proposes an algorithm of the process of GaInP thin film grown by MOCVD. KMC...
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