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A 32 nm logic technology for high performance microprocessors is described. 2nd generation high-k + metal gate transistors provide record drive currents at the tightest gate pitch reported for any 32 nm or 28 nm logic technology. NMOS drive currents are 1.62 mA/um Idsat and 0.231 mA/um Idlin at 1.0 V and 100 nA/um Ioff. PMOS drive currents are 1.37 mA/um Idsat and 0.240 mA/um Idlin at 1.0 V and 100...
A new silicon-controlled rectifier (SCR) is proposed and realized in the foundry's 0.18-mum CMOS process for electrostatic discharge (ESD) protection. Without using an extra mask or trigger circuits, the new n-type lightly doped drain and p-type halo-assisted SCR has a trigger voltage Vt1 as low as 7 V and an ESD robustness exceeding 50 mA/mum, which enables effective ESD protection. Compared with...
A leading edge 45 nm CMOS system-on-chip (SOC) technology using Hafnium-based high-k/metal gate transistors has been optimized for low power products. PMOS/NMOS logic transistor drive currents of 0.86/1.08 mA/um, respectively, have been achieved at 1.1 V and off-state leakage of 1 nA/um. Record RF performance for a mainstream 45 nm bulk CMOS technology has been achieved with measured fT/fMAX values...
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