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Measurement of plasma density, a key parameter that control the property of processing plasmas and hence the processing results, has been the focus of extensive studies in recent years, not only for characterization of the plasmas but also for development of tools for monitoring of the plasma based processes1.Inthis study, a miniature Plasma Absorption probe (mini-PAP)[2] of outer diameter 0.9 mm,...
Summary form only given. Here we report the development of microwave interferometers based on transmission-line (TL) structures for monitoring of plasma density for applications in process monitoring or realtime feedback control of plasma based semiconductor fabrication tools, such plasma etchers or PECVDs. The principle of this technique is the same as the conventional microwave interferometers except...
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