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The effect of surface roughness and surface chemistry of SiLK and Parylene polymers on the water droplet contact angle was investigated using Atomic Force Microscopy (AFM) and X-ray Photoelectron Spectroscopy (XPS). AFM images show that the surface morphologies of SiLK and Parylene treated with H 2 SO 4 and H 3 PO 4 solutions are qualitatively the same as those of the...
Cobalt thin films were deposited on the Si(100) substrates with temperatures ranging from 60 °C to 250 °C using chemical vapor deposition with a metallorganic Co 2 (CO) 8 precursor. After Ar sputtering of the surface of the films, X-ray photoelectron spectroscopy (XPS) showed negligible O peak for all samples investigated. Analysis of high-resolution XPS Co and C peaks showed that...
The increased demand for low dielectric constant (k<3.0) chemical vapor deposited polymer thin films to replace SiO2 (k=3.9–4.3) to reduce RC-delay in ultra large scale integration (ULSI) devices has prompted the synthesis of many new polymers. However, the ultimate properties of the polymer thin film are determined by its molecular structure that for polymers is often anisotropic. A basic understanding...
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