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The high-intensity pulsed ion beam (HIPIB) technique has emerged as an efficient tool for surface engineering of materials. In this work, the Ti6Al4V alloy is irradiated by HIPIB at an accelerating pulse voltage of 300 kV in a pulse width of 75 ns (FWHM) with an ion current density ranging from 60 A/cm 2 to 250 A/cm 2 under one shot. The X-ray diffraction (XRD) analysis shows that...
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