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Aluminum-catalyzed silicon nanopyramids grown using low-pressure chemical vapor deposition (LPCVD) are presented as an approach to silicon surface texturing. The nanopyramids are grown by vapor-liquid-solid growth using aluminum thin films on silicon. Silicon nanowires with hexagonal cross-sections are formed at a growth temperature of 650°C; as the temperature is increased to 700°C, the wires become...
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