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A double-exposure grayscale photolithography technique is developed and demonstrated to produce three-dimensional (3-D) structures with a high vertical resolution. Pixelated grayscale masks often suffer from limited vertical resolution due to restrictions on the mask fabrication. The double-exposure technique uses two pixelated grayscale mask exposures before development and dramatically increases...
A new gray-scale lithography method and modeling approach are reported, providing a technique for high-resolution 3D micromachining. A double-exposure grayscale technique was developed showing a significant improvement in the vertical resolution compared to single- exposure gray-scale lithography. This technique increased the number of gray-scale height levels from n levels to n levels, which decreased...
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