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Recently, we have developed a catalyst-free and direct growth approach for nanographene on various substrates by a remote-plasma assisted chemical vapor deposition. A two-step growth strategy for separately controlling the nucleation and subsequent edge growth was further developed for growing graphene sheets with adjusted nuclei density and large domain size of 500nm. The key for tuning the growth...
A simple and efficient method to repair defects in graphene oxide (GO) is reported, accompanied by a simultaneous reduction process by a methane plasma. The graphene after repair is of high quality. For a typical monolayer after repair and reduction, the minimum sheet resistance at the Dirac point and the Raman D/G peak intensity ratio are about 9.0kΩ/□ and ∼0.53, respectively.
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