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Yttria-stabilized zirconia (YSZ) films were deposited on Pt-coated silicon substrates and directly on n-type Si substrates, respectively, by pulsed laser deposition (PLD) technique using a YSZ (5 mol% Y 2 O 3 -stabilized ZrO 2 ) ceramic target. The YSZ films were deposited in 1.5x10 -2 Pa O 2 ambient at 300 o C and in situ post-annealed at 400 ...
Zr-Al-O dielectric films have been deposited on Pt-coated silicon substrates and directly on n-type Si substrates, respectively, by pulsed laser deposition technique using a (ZrO 2 ) 0.5 (Al 2 O 3 ) 0.5 ceramic target. The Zr-Al-O films deposited in 20 Pa oxygen ambient at 300 o C substrate temperature were post-annealed under various...
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