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The short wavelength and high brightness of compact extreme ultraviolet lasers is shown to enable the development of microscopes with spatial resolution of tens of nanometers and new types of nanoprobes.
In this work we demonstrate the feasibility of directly ablating sub-100 nm holes using the focused extreme ultraviolet (EUV) wavelength output from a compact lambda=46.9 nm capillary discharge laser. These results demonstrate the feasibility of sub-100 nm patterning of materials with a focused extreme ultraviolet laser beam, opening a path for the development of new nanoprobes and nano-machining...
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