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3D-LSI stack containing diametrically highly-scaled through-silicon-vias (TSVs) with diameter 2µm as well as conventional 20 µm-width Cu-TSVs were carefully studied for the thermo-mechanical stress induced by Cu-TSVs via micro-X-ray diffraction using synchrotron radiation at Spring-8. It was observed that the TSV diameter has huge impact on the magnitude of resultant thermo-mechanical stress. The...
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