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SiO2(2 nm)/Cr25Pt75(15 nm) and SiO2(2 nm)/Cr25Pt75(15 nm)/SiO2(10, 20 nm)/Co80Zr10Nb10 (10 nm) were prepared by magnetron sputtering method and post-annealed by rapid thermal annealing (RTA) at temperatures of 600??C-1000??C for 1-60 sec. The saturation magnetization Ms and coercivity Hc measured by applying a maximum field of 18 kOe were 150 emu/cc and 12 kOe, respectively, for the sample after rapid...
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