The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
A method for fabricating a thin film micropolarizer array using electron beam lithography and inductively coupled plasma-reactive ion etching (ICP-RIE) is presented. In this work, a 100 nm aluminum layer was sputtered on the substrate via magnetron sputtering, and a 140 nm layer of polymethyl methacrylate (PMMA) photoresist was spin-coated at 4000 rpm for 50 s, and prebaked at 180 °C for 120 s. The...
The traditional Vetical cavity surface emitting laser (VCSEL) circular electrode structure had the problems such as the uneven of current injection and poor beam quality, this paper we presented a new designed method VCSEL electrode structure, namely radiation electrode VCSEL, thereby improved the uniformity of the current injection and laser beam quality. Experimental, we prepared red VCSEL using...
The periodic metal grating is fabricated on SiO2 substrate by holographic lithography and stripping technology. The exposure in holographic lithography is adopted with optimized exposure time of 70s. The metal Al mask is deposited on the substrate by magnetron sputtering system. Images of scanning electron microscopy(SEM) and atomic force microscopy(AFM) show that the metal grating has a period of...
This paper designed the period, depth and duty cycle of second-order Bragg grating. The grating is fabricated on GaSb substrate by holographic photolithography and wet etching. Images of scanning electron microscopy (SEM) and atomic force microscopy (AFM) show that the grating has a period of 528nm, duty cycle of 0.25, depth of 109nm, the graphic shows an ideal sinusoid with favourable continuity...
We report on the design, fabrication and tested of high-speed, oxidation-confined 850nm VCSELs. We also compare the use of InGaAs and GaAs quantum wells(QWs) in the active region. The simulation test was showed both VCSELs of the QWs structure. The optimized InGaAs structure VCSELs can improve high-speed performance and opto-electronic characteristics. High-speed 850nm VCSELs have been fabricated...
The periodic array is fabricated on GaAs substrate by holographic lithography and wet etching. The double exposure for hole array in holographic lithography is adopted to optimized exposure time of 60s, and the optimal time of dot array is 80s. Wet etching solution with 1:1:10 volume ratio of H3PO4, H2O2 and H2O is adopted to etch the hole array for 30 s, and to etch the dot array for 20 s. Images...
Holographic photolithograph is adopted to fabricate dielectric grating of SiO2 on GaAs substrates. Scanning electron microscopy and atomic force microscopy show that the grating has a period of 528 nm, duty cycle of 0.5, thickness of 90nm, with perfect surface morphology, good fringe continuity and uniformity.
In this paper, the oxide layer of surface of GaSb could be removed by passivation solution. Moreover, different passivation solution have different passivation effect. After passivation treatment, the PL intensity was enlarged. Then the influence of prove passivation time on the intensity of PL was also discussed. When passivation time was 270s, the sample's intensity of PL was the strongest. Additionally,...
The traditional VCSEL has the problem of uneven current injection. In order to solve this problem, we designed a new electrode structure. Then we used ANSYS to simulate the thermal characteristics of VCSEL. The results showed that VCSEL with the new electrode structure had a better cooling effect than the traditional electrode structure.
In this work, ammonium sulfide ((NH4)2S) solution was used to passivated the surfaces of InP substrate. The optical properties were measured by PL (Photoluminescence) measurement, the luminescence intensity increased about 7 times when the passivated time was 15 min. The reasons of enhanced luminescence were also discussed. After passivating, the surface morphology and electrical properties were analyzed...
Vertical cavity surface emitting lasers with large aperture were fabricated by using wet oxidation technique at about 420°C, and the device chips were packaged with three different packaging methods. The optical output power and wavelength shift of the devices were compared experimentally. The device bonded with diamond spreader shows the best performance, and 200μm-diameter device produces a room...
We report the fabrication of a novel high-power VCSEL with reticular electrode in this letter. The analysis shows that the reticular electrodes can improve the homogeneity in the injected current and heighten VCSEL optical output power. The high-power reticular electrode VCSELs with 500μm aperture have been made and tested. Testing results show the slope efficiency of 0.75mW/mA, output power of up...
A new device structure is reported to improve performance of vertical cavity surface-emitting lasers (VCSELs). Namely many cylindrical holes (CH) or noncontiguous ring trench (NRT) are etched instead of the conventional ring trench (RT). The mesa with such new structure offers radial bridges for current injection, the connecting Ti-Au metal between ohmic contact and bonding pad does not have to cross...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.