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Conventional scanning probe microscopy (SPM)-based nanomanipulations always have to face scanner accuracy problems such as hysteresis, nonlinearity, and thermal drift. Although some scanners consist of internal position sensors, the sensitivity is not high enough to monitor high-resolution nanomanipulations. Additionally, once the scan size decreases to a nanolevel such as less than 100 nm, the noise...
As a very important material processing technology, plasma processing is able to modify sample surface through etching, deposition, activation, functionalization, polymerization, etc. However, the general plasma processing reacts on a large area of sample surface. Hence a mask is needed for selectively treating the sample surface. In this paper, a plasma integrated atomic force microscopic (AFM) nano...
This paper presents a novel automated manufacturing process for mass producing nano devices with superior and advanced material, carbon nanotubes (CNTs). CNTs are found to be a promising material for nanoelectronics due to their sizes and unique properties. Conventional electronic devices replaced by CNT are possibly to be miniature and provide better performance, and therefore, people have focused...
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