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Strontium barium niobate, Sr0.6Ba0.4Nb2O6 (SBN) ceramic is used as the targets to deposit the SBN thin films. By careful control of sputtering parameters, the optimal sputtering parameters for depositing SBN thin films are the substrate temperature of 500??C, chamber pressure of 10 mTorr, RF power of 120W, and oxygen concentration of 40%. The rapid-thermal annealing (RTA) process is used to anneal...
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