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Fluorinated hydrogenated amorphous carbon films were grown by plasma-enhanced chemical vapor deposition (PECVD). Two sets of films were deposited. For the first set, the self-bias voltage (V B ) was kept constant and equal to -350 V, while the CF 4 partial pressure in CH 4 /CF 4 gas mixtures was changed from 0 to 80%. For the second one, a fixed 2:1 CF 4 /CH...
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