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The poor adhesion commonly observed for c-BN thin films is caused by the high compressive stress of the films and the low adhesion strength at the interface. In general, the adhesion strength of a coating is determined by the nature of its interface to the substrate and, therefore, influenced by the nucleation process. In order to evaluate the mechanisms of c-BN nucleation a nucleation sequence was...
Measures to reduce the high compressive stress of c-BN films and to improve their adhesion are discussed. A simple model of stress formation in c-BN films reveals that high ion energies and low Ar/N 2 ratios should be used for stress reduction. These predictions are experimentally confirmed by means of depth resolved stress measurements using back-etching techniques with films deposited on...
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