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Using ECR plasma-assisted ing,?? YBa2Cu3O7-x films with c-axis orientation were grown epitaxially on (100) SrTiO3 substrates. YBa2Cu3O7-x films prepared by ECR plasma-assisted sputtering had a smaller lattice constant c and a higher Tc than films prepared by magnetron sputtering alone. Optical emisssion spectroscopy measurements were performed during deposition to investigate the relationship between...
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