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This article presents a short discussion on the fabrication of photonic metamaterials. The method of choice for fabricating metamaterials is still electron beam lithography despite its intrinsic drawbacks like long writing time and high operation costs. Thus only small areas can be structured within reasonable time and at reasonable costs. Another way to fabricate high-quality photonic metamaterials...
We present a novel approach for fabricating large-area (16 times 22 mm2) magnetic metamaterials with a negative magnetic permeability at telecom wavelengths. Our approach brings the complexity of fabricating magnetic layers down to that of dielectric layers.
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