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The paper reports on a new system for plasma nitriding combined with a hollow cathode discharge sputtering at high pressures (about 1000Pa), a new way of producing duplex coatings, and on a low-pressure (0.1-0.3Pa) plasma nitriding using microwave discharges. It has been shown that an addition of an auxiliary cathode into a conventional high-pressure nitriding system can improve properties of the...
This paper reports on an advanced duplex coating technique (DCT) which consists of two processing steps: (i) deposition of the coating on the substrate, and (ii) plasma nitriding of the coating/substrate couple. The order of the processing steps is reversed when compared to that of the conventional DCT. This makes it possible to avoid the formation of nitrides in the coating/substrate interface and...
The paper reports on a new way of producing duplex coatings consisting of two steps. First, the substrate is coated by a physically vapour-deposited coating. Then, this precoated substrate is plasma nitrided or vacuum heat treated. This method was tested in the protection of substrates made of aluminium with a sputtered Ti coating about 5 μm thick. The as-deposited and then plasma-nitrided or vacuum-heat-treated...
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