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We applied an in situ electrochemical atomic force microscope (AFM) to investigate the pitting corrosion and the effect of benzotriazole (BTA) on corrosion inhibition of Cu films in 0.01 M NaHCO 3 . The Cu films are 800 9 thick deposited on polished Si(100) wafers. Pit growth was observed in a range from hundreds of nanometers to millimeters using the combination of atomic force microscopy...
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