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Ag thin films were deposited by magnetron sputtering in a mixture of argon and nitrogen. The salt-water durability and reflectance of Ag thin films were investigated as a function of nitrogen gas flow ratio during sputter deposition. The reflectance of as-deposited Ag thin films decreased with increasing nitrogen gas flow ratio; however, the difference in visible-light reflectance between the Ag thin...
The effects of the magnetic flux density of the Ag sputter target surface on plasma parameters were investigated using the Langmuir probe system in this work. It was found that the electron energy and electron density near the substrate clearly decreased at a high magnetic flux density. In addition, the difference between plasma potential and floating potential (V p −V f ) decreased...
The resistivity and crystal structure of Ag thin films were investigated as a function of the cathode voltage during the Ag sputter deposition. Low emissivity (low-e) coatings with a layered construction of glass/dielectric/Ag/dielectric were deposited by magnetron sputtering. It was found that the Ag layers in the low-e coatings showed lower resistivity when lower cathode voltage was applied. Furthermore,...
The effects of a metal oxide under-layer on the resistivity of a Ag layer were investigated. Ag-based multilayers, which have a layer construction of glass/ZnO under-layer/Ag/ZAO (Al-doped ZnO) blocker/ZnO top layer, were deposited by DC magnetron sputtering with changing the sputter gas pressure during the under-layer deposition and it was confirmed that the Ag layer showed low resistivity when the...
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