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In this work, we demonstrate the fabrication of silicon nanowires down to 22nm wide using trilayer nanoimprint lithography and wet etching. Using the same template prepared by E-beam lithography (EBL), nanowires with top width of 22nm and 75nm are fabricated on boron-doped top silicon layer of SOI substrate. The two samples are tested in 250ppm NO 2 ambient for gas detection. The 22nm wide...
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