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In this paper, hydrofluoric acid (HF) was used as catalyst in sol–gel method to prepare nanoporous silica thin film with ultra-low dielectric constant (k). The introduction of HF not only produced the Si–F bonds, which has the lower polarizability deriving from the least electronegative of fluorine ion, but also adjusted the speed of sol–gel reaction. The microstructure morphologies of the films catalyzed...
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