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Two‐step chemical vapor deposition (CVD) method is a promising technique for industrial fabrication of low‐hydroxyl silica glass ingot, in which a porous silica preform is first synthesized by flame hydrolysis deposition, which is subsequently sintered and vitrified to form silica glass. During sintering hydroxyls can be easily removed through the small pores in porous silica preform, which is called...
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