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Teflon thin films were prepared via pulsed laser deposition using an ArF excimer laser (λ=193 nm, FWHM=20 ns) from pressed powder pellets. The applied fluence was 6.25±0.23 J/cm 2 , the number of pulses was 10000, the pressure in the vacuum chamber was 2×10 −5 Torr and the substrate temperature was 250 °C. The layers were post-annealed at temperature within the range 320–500 °C. The...
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