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An ultra-thin layer of Fe 3 O 4 , with a roughly ordered (111) face, prepared on a Mo(110) substrate has been used to grow ZnO films under ultra high vacuum condition. In situ X-ray photoelectron spectroscopy and low energy electron diffraction indicate that the ZnO(0001) films, with marginal ordering, are epitaxially grown on the Fe 3 O 4 (111) surface. Compared with...
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