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High coercivity was obtained in Co-Cu granular films, RF sputtered on Si(100) substrates, when the Co content is less than about 40at% and annealed at high temperatures. Perpendicular anisotropy was observed in the Co-rich films, where the Co content is not less than about 40at% atom. The reasons for the high coercivity and the perpendicular anisotropy in these Co-Cu films are discussed.
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