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We report on the fabrication of artificial nanostructures in ultrathin resist films patterned by STM-lithography in ultrahigh vacuum ambience. A special type of resist, an alkanethiol-type Self-Assembled-Monolayer (SAM), has been patterned by an UHV-STM. The SAM patterns were investigated by STM without modifying the surface. Pattern width down to 15 nm were reproducibly achieved with 1 V bias voltage...
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