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The focused ion beam technique is a frequently used method to manufacture photonic crystal structures due to its capability of defining patterns in a wide range of materials without using masks. One critical drawback of FIB milling technique is the non-vertical profile resulted from redeposition effects during lithography. Tapered sidewalls may impact the performance of the fabricated device significantly...
Patterning with ion beams at the nanometer scale has found various important applications in optoelectronics and nanofabrication. During the process of focused ion beam milling, many different effects occur simultaneously, including sputtering, material redeposition, and implantation. Based on the powerful and versatile capability of the focused ion beam technique, we propose a novel method to fabricate...
Coaxial structures are extremely crucial for investigations on surface plasmons since they exhibit special optical properties compared with apertures with other shapes. Different from the traditional extraordinary optical transmission (EOT) observed from nanohole arrays, these ring-like structures can excite cylindrical surface plasmon and planar surface plasmon simultaneously. The nanoring cavities...
In this work, we show the fabrication of nanocrescent arrays with different sizes. We also investigate the optical response of such nanocrescent arrays and perform theoretical calculations. Our approach may find extensive applications in nanophotonics and integrated optics.
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