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Atomic Vapor Deposition and Atomic Layer Deposition techniques were applied for the depositions of Ta 2 O 5 , Ti–Ta–O, Sr–Ta–O and Nb–Ta–O oxide films for Metal–Insulator–Metal (MIM) capacitors used in back-end of line for Radio Frequency applications. Structural and electrical properties were studied. Films, deposited on the TiN bottom electrodes, in the temperature range of 225–400°C,...
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