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Nanostructured carbon films with thicknesses of 100 and 200nm have been deposited from pure vapour carbon plasma using an original thermionic vacuum arc method. Silicon single crystalline wafers, glass and stainless steel held at 400°C were used for substrates. The films consist of diamond nanoparticles of 5nm diameter on the average embedded in a disordered graphite matrix as revealed by HRTEM, XPS...
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