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Three kinds of ultrathin amorphous carbon nitride films (α-CN x ) with different internal stress were deposited on silicon (111) substrates by an ion beam assisted deposition method. The as-deposited α-CN x was post-annealed to eliminate the internal stress. The microstructure and nanomechanical properties of both as-deposited and annealed α-CN x were studied by using micro...
Pursuit of ever-increasing storage density has lead to a steady reduction in head-disk separation which requires protective coating as thin and as hard as possible. It has been found that the internal stress affects micro-tribological properties of CN x film. In this study, thin hard CN x overcoats with different internal stress were synthesized by an ion beam assisted deposition method...
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