The Infona portal uses cookies, i.e. strings of text saved by a browser on the user's device. The portal can access those files and use them to remember the user's data, such as their chosen settings (screen view, interface language, etc.), or their login data. By using the Infona portal the user accepts automatic saving and using this information for portal operation purposes. More information on the subject can be found in the Privacy Policy and Terms of Service. By closing this window the user confirms that they have read the information on cookie usage, and they accept the privacy policy and the way cookies are used by the portal. You can change the cookie settings in your browser.
An innovative planarization system named “plasma fusion CMP” was developed for aiming to establish a high-efficiency/high-quality polishing process of the hard-to-process materials. In this study, we applied this system to processing of diamond substrate instead of conventional CMP (Chemical Mechanical Polishing) process. We confirmed that stable atmospheric plasma was generated in our dynamic system,...
In recent years, wide band gap semiconductors, such as SiC and GaN, are attracting extensive attention as an alternative material of Si semiconductors. However, issues such as reduction of the production cost and improvement of the productivity prevent wide-spread application of these materials in the world. This study was conducted under the collaborative research and development with various specialized...
Set the date range to filter the displayed results. You can set a starting date, ending date or both. You can enter the dates manually or choose them from the calendar.