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We have investigated the metal pillar defect induced by tungsten (W)-plug missing inside contact hole sitting on the long W-plug LIL trench line in sub-micron CMOS technology. It is found that W-plug LIL trench line may have a seam due to high aspect ratio, resulting in W contact-plug missing caused by out-gassing from a seam inside the long trench LIL line. This missing W contact-plug can make defect...
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