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This paper reports the photoelectric property and surface morphology of amorphous titanium dioxide (TiO2) made at the different substrate temperatures by RF- sputtering on the glass. Five different temperatures (room temperature, 100degC, 200degC, 300degC and 400degC) are set on the substrate holder. The thicknesses of the film are 100 nm, 300 nm and 500 nm. After preparing amorphous TiO2 thin film,...
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