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We fabricate a blind hole surface texture by anodic etching of macroporous Si. The blind holes, i.e., pores that do not penetrate the wafer completely, have an average diameter of 2.7 μm, a distance of 4 μm, and a depth of 9 μm. This texture is capable of reducing the AM1.5G photon flux-weighted front reflectance to 1.5% without depositing an antireflection coating. The μm-feature size makes it a...
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